ECOLE DOCTORALE 352 CINaM/UMR 7325 Thèse présentée pour ...
... TD, TG). Publiée: avec rapport de recherche ... - pulse de tétrakis(diméthylamino) d'étain (TDMASn). ... TDMASn. Le canister délivrant le précurseur de l ...
Untitled - googleapis.comABSTRACT. Indium oxide and doped indium oxide films were successfully grown utilizing a plasma-enhanced atomic layer deposition supercycling. Hydrogen Plasma-Assisted Spatial Atomic Layer Deposition of SnOxGrowth rates for the 4d- and 5d-metal-based processes vary significantly, the lowest GPC value being 0.1 Å per cycle for the TDMASn + EG and ... Atomic/Molecular Layer Deposition for Designer's Functional Metal ...This article describes a new atomic layer deposition (ALD) method for preparing indium tin oxide (ITO) thin films using nonhalogenated precursors.
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