Dissertation

Using a cyclical FC and argon plasma process it is possible to atomically etch silicon oxide in a conventional plasma etch tool with minimal ...







Développement et caractérisation de procédés de gravure plasma ...
etching and micro9a8e plasma etching of silicon?, (ppl. Phys. Lett ... « Gra8ure 1 anisotrope » et que l'undercut augmente légèrement dans les ...
A Mathematical Model for a Parallel Plate Plasma Etching Reactor
ABSTRACT. A mathematical model was formulated for predicting species concentration profiles and etch rate distribution in a par- allel plate plasma reactor.
Wafer-Scalable Fabrication of Metal Nanostructures for Plasmonics ...
Figure 2.15 (A) Undercut etching, or known as notching, would occur when the SOS chips were etched for too long in the plasma; (B) no undercut etching around.
Guide to references on III±V semiconductor chemical etching
This guide is given as four annotated sections to make the etching information as accessible as possible. Section 2 lists wet etchants by there applications, ...
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